• GaN-on-HR_Si (100mm,150mm,200mm)
• GaN-on-SiC(50.8mm,100mm,150mm)
• In-situ SiN/ Al(In)N/ GaN heterostructures
Product Specification
Items | Values/Scope |
Substrate | HR_Si / SiC |
Wafer diameter | 100mm,150mm for SiC 100mm,150mm,200mm for HR_Si |
Epi-layer thickness | 2-3 μm |
Wafer bow | <30 μm, Typical |
Surface Morphology | RMS<0.5nm in 5×5 μm² |
Barrier | AlGaN or AlN or InAlN |
Cap layer | In-situ SiN or GaN |
Sheet Resistance | 2DEG | Electron Mobility |
Rsh = 291 Ω/□ | 2DEG = 1.17E13/cm² | μ = 1833 cm²/Vs |
Sheet Resistance | 2DEG | Electron Mobility |
Rsh = 282.2 Ω/□ | 2DEG = 1.24E13/cm² | μ = 1802 cm²/Vs |